Thin-layer Deposition: CVD, Ion Implantation, & Epitaxy
Report Highlights
- The global market for chemical vapor deposition (CVD) will increase from $7.0 billion in 2007 to an estimated $7.3 billion by the end of 2008. It should reach $11.8 billion by 2013, a compound annual growth rate (CAGR) of 10.2%.
- The ion implantation segment will grow at a CAGR of 10.1% between 2008 and 2013 and be worth $4.4 billion by the end of the study period.
- Molecular beam epitaxy (MBE) equipment is expected to reach $475.4 million in 2008. It is projected to grow at an 8.1% CAGR through the end of the forecast period to reach $701.3 million by 2013.
INTRODUCTION
BCC Research's goal in conducting this study was to determine the current status of the global market for chemical vapor deposition (CVD), ion implantation, and molecular beam epitaxy (MBE) equipment, as well as materials deposited and services. Our intention was to assess the growth potential of these thin film technologies over a period ranging from 2007 to 2013. We were particularly interested in the types of equipment and materials being used for consumer and industrial applications. BCC Research has recently published studies regarding physical vapor deposition (PVD) and atomic layer deposition (ALD). This study is intended to complete the analysis of these three thin film technologies. Studies concerning CVD, ion implantation, and MBE were completed 5 years ago.
The major objective of this study is to present a comprehensive analysis of these remaining thin film technologies and project their future course.
The major objective of this study is to present a comprehensive analysis of these remaining thin film technologies and project their future course.
SCOPE OF STUDY
This report contains:
- Descriptions of various thin film technologies including chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE)
- Discussion of the advantages and limitations of each technology
- The current market status for CVD, ion implantation and MBE, with trends and forecasts for growth over the next 5 years
- Domestic and international technological issues
- Analysis of the industry's manufacturing capacity and consumption by various regional markets
- Industry structure and company profiles.
METHODOLOGY
Primary and secondary research methods were used to collect data and information for this report. This BCC Research report presents an analysis of the value of these three thin film systems, materials deposited, and services provided by type of technology, material, and industry segment. The estimated value is the amount that manufacturers and service providers have paid in current dollars. Based on our surveys, we then analyze industry growth in relation to the growth of each thin film technology, calculate estimates of growth, and forecast shipments to 2013.
INFORMATION SOURCES
BCC interviewed approximately 120 companies to obtain data for this report. Included were manufacturers of CVD, ion implantation, and MBE equipment, as well as material suppliers, deposition service providers, industrial and consumer product manufacturing companies, and various end users of products manufactured using these processes. Additional data were obtained from government information, trade associations, industry and financial sources, and an exhaustive review of technical literature.
ANALYST CREDENTIALS
Robert H. Moran has written extensively as a research analyst and editor at BCC Research. The topics of his reports range from various deposition technologies to photovoltaics and solid state lighting. Mr. Moran has been writing for BCC Research for more than 20 years. He holds Bachelor of Science degree in Economics from the University of Pennsylvania.
Frequently Asked Questions (FAQs)
Report Highlights
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The total market for ion implantation equipment, services and materials is estimated at $1.05 billion in 2001 and is expected to rise to $3.41 billion in 2006, an average annual growth rate (AAGR) of 26.6%.
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By contrast, ion implantation equipment and materials shipments both fell by 49% in 2001, the largest declines ever.
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The total market for MBE equipment, services and materials is estimated to be $249 million in 2001, increasing to $1.05 billion in 2006 at an AAGR of 33.3%. Despite economic conditions, MBE equipment and materials shipments increased in 2001.
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Spurring growth are the semiconductor merchant wafer markets. These will grow strongly through the period, particularly for thin-film silicon-on-insulator wafers made by ion implantation.
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By 2006, the service markets for ion implantation and MBE are expected to be nearly as large as the respective equipment markets.
Report Highlights
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The value of worldwide shipments of PVD equipment reached $3.4 billion by 1999. Shipments are forecast to grow in value by 12.7% and reach $3.9 billion by the end of 2000, and at an average annual rate of 11.3% to reach $6.7 billion by 2005.
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The value of materials to be deposited by PVD reached $474.2 million in 1999. It is projected to grow by 13.5% to reach $538.2 million by 2000 and at an average annual rate of 11.9% to reach $943.9 million by 2005.
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The value of PVD services totaled $766.9 million in 1999. They will grow in value by 9.4% to reach $838.9 million by 2000 and at an average annual rate of 9.3% to reach $1.3 billion by 2005.
Report Highlights
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The value of worldwide shipments of CVD equipment reached $3.7 billion by 1999. Shipments are forecast to grow in value by 12.9% and reach $4.2 billion by the end of 2000, and at an average annual rate of 11.0% to reach $7.1 billion by 2005.
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The value of materials to be deposited by CVD reached $450.8 million in 1999. It is projected to grow by 12.7% to reach $508 million by 2000 and at an average annual rate of 10.9% to reach $849.7 million by 2005.
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The microelectronics industry, encompassing semiconductors, components, and flat panel displays represents the largest market for CVD equipment, materials and services. This sector will grow at an AAGR of about 12% through the forecast period. The growth of materials in this market will be led by dielectric and diamond-like films as device geometries continue to shrink and levels expand.