May 05, 2008
Wellesley, Mass—According to a new technical market research report, THIN-LAYER DEPOSITION: CVD, ION IMPLANTATION & EPITAXY (SMC027G) from BCC Research, the global markets for chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE) will experience significant growth between 2008 and 2013.
CVD has the largest market of these technologies. The total CVD segment, including equipment,materials and services, was worth $7.0 billion in 2007. This is expected to increase to $7.3 billion by the end of 2008, and to $11.8 billion in 2013, for a compound annual growth rate (CAGR) of 10.1%.
Ion Implantation and related ion equipment have the second largest market, worth $2.6 billion in 2007. This will grow at a 4.5% CAGR through 2008 and then at a 10.1% rate by 2013 when the segment will be worth $4.4 billion.
The MBE segment reached $457.4 million in 2007 and is expected to increase to $475.4 million by the end of 2008. By the end of 2013, the segment will be worth $701.3 million, for a CAGR of 8.1%.
Materials for these three technologies constitute a major market. Materials deposited by CVD reached $671 million by 2007 and will grow at a 4.2% CAGR during 2008 and then at a 10.3% CAGR through 2013 to reach $1.1 billion. Ion-related materials are the least costly of these technologies and reached $65 million in 2007 and will ultimately grow at an 8% CAGR to reach $110 million in 2013. Epitaxial materials reached $41 million in 2007 and will grow at a 3.9% CAGR during 2008 and then at an 8% CAGR through 2013.
Source: BCC Research
Thin-layer Deposition: CVD, Ion Implantation, & Epitaxy( SMC027G )
Publish Date: Apr 2008
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