:: Atomic Layer Deposition (SMC061A) ::

Semiconductor Manufacturing

Atomic Layer Deposition

Report Code: SMC061A, Published: March 2006

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REPORT HIGHLIGHTS

The worldwide global market for atomic layer deposition increased from $151.6 million in 2003 to an estimated $214.1 million by the end of 2005.
Process equipment sales represent the largest share of this market. Their average annual growth rate (AAGR) is projected to be 23.1% over the next five years, resulting in global ALD system sales of $487.3 million by 2010.
Raw materials revenue growth, driven by the utilization of ALD for the deposition of metal oxide films and other future fast growing applications such as the deposition of high-k gate oxides and nitridebased barrier layers, is projected to grow at an AAGR of 25.6% for the next five years and reach $130.3 million by 2010.

Report Code: SMC061A, Published: March 2006, Analyst: Margareth Gagliardi

INTRODUCTION

With the growing need for component and assembly miniaturization and the approaching “nanotechnology era,” longstanding technologies represented by well established thin film processes are rapidly becoming obsolete. As a result, manufacturers of technically advanced devices in the fields of electronics, mechanics, chemistry, optics and energy, are introducing systems and processes that allow the deposition of nanoscale-level films having enhanced electrical, chemical, and physical properties. Thus, one technology gaining momentum is atomic layer deposition (ALD), a relatively new thin film technology that is particularly well suited for the deposition of nanoscale films.

This important study details current and potential applications of this deposition method, the types of film deposited, precursors used, and the basic ALD process, including an array of process variants, upgrades, and new features. BCC Research assesses the current ALD industry status, and evaluates market trends and research activities, and their impact on industry growth. It also studies the worldwide market for this thin film deposition method, and forecasts industry growth potential for ALD over a five-year period from 2005 through 2010.

This study will be invaluable to decision-makers, strategic planners and marketers in all companies involved in the fabrication and selling of thin film devices, process equipment, and raw materials.

SCOPE OF STUDY

This comprehensive study:

Provides information on the basic atomic layer deposition process, with its variants and upgrades, focusing on raw materials and equipment used

Identifies various types of precursors and production systems, determines their current market status, defines trends, and presents forecasts of growth over the next five years

Discusses technological issues, including the latest process developments, and compares them with alternative thin film methods

Analyzes the ALD industry on a worldwide basis from the standpoint of both manufacturing and consumption

Supplies a detailed description of current and potential applications of ALD technology

Examines commercial and public research activities in major regions of the world.

METHODOLOGY

BCC Research's market analysis is essentially divided into five parts. In the first part, a historical and technical review of the atomic layer deposition process is provided, followed by an outline of the technological factors affecting the ALD process. In this section, a thorough description of current and potential applications for this technology is also supplied, divided by sector (i.e., electronics, mechanical/chemical, energy, optics, medical/biological/dental, and nanotechnology). A comparison with alternative thin film deposition processes completes this part.

The second part of the report entails a global market analysis of the ALD industry, based on two categories of products: ALD precursors and equipment. Various types of precursors are described, followed by a review of related recent technological developments and patent abstracts. Global raw materials revenues (sales data in M$) are presented for each type of material, and by application and region, with actual data referring to the years 2003, 2004 and estimated data for the year 2005.

Additionally, basic equipment design is described, together with a discussion of new features and improvements and significant patents. To characterize the current ALD equipment market, global revenues are reported by process type, application, and region, for the period 2003 through 2005.

This section is completed by a presentation of market growth trends based on industry growth, technological trends, equipment upgrades, and regional trends. Projected revenues for both raw materials and systems are reported, with forecast average annual growth rates (AAGRs) for the period 2005 through 2010.

In the third part, covering global industry structure, the report supplies a complete list of manufacturers of ALD raw materials and equipment together with a description of their products. The analysis includes a description of the geographical distribution of these firms, and an evaluation of ALD precursors and equipment production versus consumption, always from a geographical standpoint. Detailed company profiles of the top 25 players and market share for the five leading companies are also provided.

In the fourth part of this study, an analysis of industry competitiveness is performed. This analysis encompasses a review of global research and development activities, with profiles of the most important R&D players divided by region, and an outline of the most critical factors contributing to industry competitiveness.

The fifth and final section includes extensive global patent analysis, with a summary of patents related to ALD raw materials, equipment, process, and applications, issued during the period 2000 through 2005. Patent analysis is performed by assignee, patent category, application, and material type.

INFORMATION SOURCES

To perform this study BCC Research analyzed 42 manufacturers of raw materials and equipment used for atomic layer deposition, accounting for at least 95% of the global ALD market. Data for each company were obtained by thoroughly analyzing SEC filings, Internet Web sites, annual reports, industry directories, industry magazines, government sources, and other public sources.

Additional data were obtained from the direct contribution of primary sources, including: company executives, managers, engineers and other technical personnel representing manufacturers of ALD raw materials, and process equipment; representatives of academia and trade associations; and industry market analysts.

Secondary sources of information included the following:

EDGAR-U.S. Securities and Exchange Commission Filings

U.S. Patent and Trademark Office

Company Web Sites

Company Annual Reports

Thomas Register

Moody's Directory

S & P Industry Survey

Dun & Bradstreet Business Directory

American Ceramic Society Annual Meeting Abstract

Foreign Chamber of Commerce Directories

Foreign Stock Exchange Listings.

ANALYST CREDENTIALS

Margareth Gagliardi has over 20 years of experience in the field of advanced materials, specializing in ceramic formulations, materials processing, and new product development. She has held management positions in both manufacturing and R&D within U.S. and European firms producing electronic, mechanical, chemical, and structural components. She holds a B.S. in Chemical Engineering and an M.S. in Ceramic Engineering.

Report Code: SMC061A, Published: March 2006, Analyst: Margareth Gagliardi