Sputtering Targets and Sputtered Films: Technology and Markets

Published - Apr 2008| Analyst - Margareth Gagliardi| Code - SMC037D
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Report Highlights

  • The global market for sputtering targets and sputtered films reached $2.8 billion in 2007. It should reach $5.9 billion by 2012, a compound annual growth rate (CAGR) of 15.8%.
  • The microelectronics sector has been the largest consumer of sputtering targets but will be eclipsed by advanced displays and solar cells over the next 5 years.
  • Sputtering target consumption will rise at a slower rate than production of sputtered films over the next 5 years due to higher target utilization rates and decreased film thickness in certain market segments.

INTRODUCTION

Since October 2005, when the last edition of the report ""Sputtering Targets, and Sputtered Films: Technology and Markets"" was published, a number of changes have occurred in the sputtering targets market. With this study, BCC Research intends to provide an updated review of the technological advancements achieved in the field of sputtering technologies, with special focus on the fabrication of sputtering targets and sputtered films.

A current evaluation of the worldwide market for sputtering targets and sputtered films is also offered, together with an assessment of the market growth potential over a 5-year period from 2007 through 2012.

The major objectives of this study are:

  • Supply an update of the most advanced sputtering methods and emerging processes.
  • Provide an overview of materials commonly used for the fabrication of sputtering targets and identify new materials.
  • Review the latest methods for fabricating sputtering targets.
  • Highlight new technological developments in the fabrication of sputtering targets, while outlining technical issues.
  • Review the several fields of applications for sputtering technologies and investigate emerging applications.
  • Estimate current worldwide markets for sputtering targets and sputtering films, with growth forecasts through 2012 for each market segment.
  • Identify important technology and market trends within each market segment.
  • Supply an updated review of current producers of sputtering targets.
  • Provide a description of current worldwide research activities.
  • Determine trends in U.S. and worldwide patents issued during the most recent years.

SCOPE OF STUDY

This report contains:

  • Descriptions of various sputtering target applications including those for semiconductors, passive components, optical storage media, solar cells, medical implants and nanostructures
  • The current global market status of sputtering targets and sputtered films, with trends and forecasts for growth over the next 5 years
  • Discussion of worldwide research activity
  • A review of the latest methods for fabricating sputtering targets
  • Company profiles.

METHODOLOGY AND INFORMATION SOURCES

The technology section of this report is based on information derived from technical literature, professional journals, author's field experience, and online sources.

Global market analysis was performed by analyzing 101 manufacturers of sputtering targets, accounting for at least 90% of the worldwide market. Data for each company were obtained by thoroughly analyzing Securities and Exchange Commission (SEC) filings, Internet Web sites, annual reports, industry directories, industry magazines and catalogs, government sources, and other public sources.

Additional data were obtained from the direct contribution of primary sources, including: company executives, managers, engineers, and other technical personnel representing manufacturers and developers of sputtering targets and related materials and process equipment; representatives of academia and trade associations; and industry market analysts.

Secondary sources of information include:

  • EDGAR - U.S. Securities and Exchange Commission Filings
  • U.S. Patent and Trademark Office
  • European Patent Office
  • Company Web Sites
  • Company Annual Reports
  • Thomas Registers
  • Moody's Directory
  • S & P Industry Survey
  • Dun & Bradstreet Business Directory
  • American Ceramic Society Publications
  • Foreign Chamber of Commerce Directories
  • Foreign Stock Exchange Listings.

In addition to utilizing the above primary and secondary sources, market growth trends and forecasts were compiled by gaining additional insights from relevant financial and market information, relevant BCC reports, and the author's own in-depth analysis of all the information.

ANALYST CREDENTIALS

Margareth Gagliardi has 25 years of experience in the field of advanced materials, specializing in ceramic formulations, materials processing, and new product development. She has held management positions in both manufacturing and R&D within U.S. and European firms producing electronic, mechanical, chemical, and structural components. She holds a B.S. in Chemical Engineering and an M.S. in Ceramic Engineering.

She has authored several BCC Research studies, including the following which are related to advanced materials, thin and thick film technologies, and nanotechnology:

  • NAN042A Nanorobotics and NEMS, 2007
  • NAN043A Nanofibers: Technologies and Developing Markets, 2007
  • SMC061A Atomic Layer Deposition, 2006
  • SMC057A Thin Films: Raw Materials, Technology, and Applications, 2005
  • AVM046A Thick Film Devices, Processes, and Applications, 2004

Table of Contents & Pricing

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Published - Oct-2005| Analyst - Margareth Gagliardi| Code - SMC037C

Report Highlights

  • The global market for sputtering targets is expected to reach $1.94 billion in 2005 and will increase at an average annual growth rate (AAGR) of 9.7%, nearing $3.1 billion by 2010.
  • A total of 1.29 million targets will be consumed to deposit 1,003.3 million square meters of films in 2005, rising to 1.6 billion square meters while units drop to 700,000 due to larger target sizes by 2010.
  • Major applications include semiconductors, microcomponents, flat panel displays, magnetic and optical storage devices, wear and corrosion resistant coatings, solar cells and others.
  • Some 12,181.8 thousand lbs. of material will be consumed in 2005 to produce targets and 15,865.5 thousand lbs. by 2010.
Published - Oct-2002| Analyst - Mindy Rittner| Code - SMC037B

Report Highlights

  • The worldwide market for sputtering targets reached $871.5 million in 2001. Rising at an average annual growth rate (AAGR) of 15.4%, this market will approach $1.8 billion in 2006.
  • Sputter deposition accounted for 486.1 million square meters of thin films in 2001, a figure expected to exceed 1.0 billion square meters in 2006, rising at an AAGR of 16.5%.
  • The market totaled about 305.9 thousand targets in 2001 and is expected to reach 496.8 thousand units in 2006, a 10.2% AAGR. This represents 2,365.7 and 4,373.1 thousand kg of material, respectively.
  • Target consumption will rise at a slower rate than production of sputtered films primarily due to more efficient use of material, film thickness decreases in some market segments and a transition to larger target sizes in some segments.

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