:: Thin-layer Deposition: CVD, Ion Implantation, & Epitaxy (SMC027G) ::

Semiconductor Manufacturing

Thin-layer Deposition: CVD, Ion Implantation, & Epitaxy - SMC027G

Also see:
  SMC027F - March 2002
  SMC027E - December 2000
  SMC027D - September 2000

This Report:

The global market for chemical vapor deposition (CVD) will increase from $7.0 billion in 2007 to an estimated $7.3 billion by the end of 2008. It should reach $11.8 billion by 2013, a compound annual growth rate (CAGR) of 10.2%.
The ion implantation segment will grow at a CAGR of 10.1% between 2008 and 2013 and be worth $4.4 billion by the end of the study period.
Molecular beam epitaxy (MBE) equipment is expected to reach $475.4 million in 2008. It is projected to grow at an 8.1% CAGR through the end of the forecast period to reach $701.3 million by 2013.

Report ID:SMC027G, Published: April 2008, Analyst: Robert Moran

INTRODUCTION

BCC Research\'s goal in conducting this study was to determine the current status of the global market for chemical vapor deposition (CVD), ion implantation, and molecular beam epitaxy (MBE) equipment, as well as materials deposited and services. Our intention was to assess the growth potential of these thin film technologies over a period ranging from 2007 to 2013. We were particularly interested in the types of equipment and materials being used for consumer and industrial applications. BCC Research has recently published studies regarding physical vapor deposition (PVD) and atomic layer deposition (ALD). This study is intended to complete the analysis of these three thin film technologies. Studies concerning CVD, ion implantation, and MBE were completed 5 years ago.

The major objective of this study is to present a comprehensive analysis of these remaining thin film technologies and project their future course.

SCOPE OF STUDY

This report contains:

Descriptions of various thin film technologies including chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE)
Discussion of the advantages and limitations of each technology
The current market status for CVD, ion implantation and MBE, with trends and forecasts for growth over the next 5 years
Domestic and international technological issues
Analysis of the industry\'s manufacturing capacity and consumption by various regional markets
Industry structure and company profiles.

METHODOLOGY

Primary and secondary research methods were used to collect data and information for this report. This BCC Research report presents an analysis of the value of these three thin film systems, materials deposited, and services provided by type of technology, material, and industry segment. The estimated value is the amount that manufacturers and service providers have paid in current dollars. Based on our surveys, we then analyze industry growth in relation to the growth of each thin film technology, calculate estimates of growth, and forecast shipments to 2013.

INFORMATION SOURCES

BCC interviewed approximately 120 companies to obtain data for this report. Included were manufacturers of CVD, ion implantation, and MBE equipment, as well as material suppliers, deposition service providers, industrial and consumer product manufacturing companies, and various end users of products manufactured using these processes. Additional data were obtained from government information, trade associations, industry and financial sources, and an exhaustive review of technical literature.

ANALYST CREDENTIALS

Robert H. Moran has written extensively as a research analyst and editor at BCC Research. The topics of his reports range from various deposition technologies to photovoltaics and solid state lighting. Mr. Moran has been writing for BCC Research for more than 20 years. He holds Bachelor of Science degree in Economics from the University of Pennsylvania.

Report ID:SMC027G, Published: April 2008, Analyst: Robert Moran