ASM International N.V.

Dragon XP8 PECVD: Dragon XP8 is a system that can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high-volume production within a very compact footprint.  

Epsilon 2000 Epitaxy: Epsilon 2000 single-wafer epitaxy tool offers a wide variety of epitaxy applications for 150mm and 200mm wafers. They range from high-temperature silicon for wafer preparation to low-temperature selective or non-selective silicon germanium (SiGe) for forming transistor strain layers. Intrepid ES and Intrepid ESA Epitaxy: The Intrepid ES is an epitaxy deposition tool that is designed for the most critical 300mm applications for advanced transistors and memories.

Eagle XP8 PEALD: Eagle XP8 is a high-productivity 300mm tool for plasma-enhanced ALD (PEALD) applications. The Eagle XP8 PEALD system can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high volume production within a very compact footprint. XP8 QCM PEALD: XP8 QCM is a PEALD tool focused on advanced node memory and logic applications. It is capable of a broad range of dielectric PEALD processes, including silicon oxide and silicon nitride