| Lithography Systems |
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NSR-S636E: The NSR-S636E utilizes an enhanced inline Alignment Station (iAS), that has been incorporated in previous models, enabling high-precision measurement, and extensive wafer warpage and distortion correction capabilities, all while maintaining maximum scanner throughput.,NSR-S635E: The NSR-S635E ArF immersion scanner with integrated inline Alignment Station (iAS) developed for high-volume semiconductor manufacturing., NSR-S625E: This is the NSR-S625E ArF immersion scanner, which inherits the proven Streamlign platform. It delivers a throughput approximately 1.3 times that of its predecessor, the NSR-S622D, and has significantly improved its operational stability.,NSR-S322F: The NSR-S322F ArF scanner delivers enhanced overlay accuracy and productivity by employing the proven Streamlign platform.,NSR-S220D: It offers throughput of more than 230 WPH and high accuracy of below 6 nm MMO.,NSR-SF155: The NSR-SF155 i-line stepper is suitable for the production of a wide range of semiconductor devices. The NSR-SF155 utilizes Skyhook Technology, which enables the projection lens to be suspended from the body and away from the floor, reducing vibration levels. With its increased wafer stage speed, the NSR-SF155 delivers throughput of more than 200 wafers per hour for 300 mm wafers.,NSR-2205iL1: It offers optimized production of various semiconductor devices regardless pf the wafer materials. |
| Metrology/Inspection Systems |
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AMI-5700: The AMI-5700 makes both high throughput and exceptional detection sensitivity very achievable. The aim of this device is to realize higher sensitivity and accuracy than previous models. It achieves high-speed measurement and inspection by performing batch imaging of the entire wafer surface.,OPTISTATION-3200/3100/3000: The OPTISTATION-3200/3100 is equipped with Nikon's CFI60-2 optics, producing clear images with high contrast and minimal flare.,N-SIS9/8: The N-SIS9/8 is an illumination system specialized for image sensor inspection. The system provides high-power, highly uniform illumination over a large inspection field, enabling high-speed illuminance setting and high-speed spectral settings including RGB. |