Thin-layer Deposition: CVD, Ion Implantation and Epitaxy

Published - May 2014| Analyst - Mayank Jain| Code - SMC027H
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Report Highlights

The global chemical vapor deposition (CVD) market is expected to increase from $5 billion in 2014 to nearly $6.8 billion by the end of 2019, a compound annual growth rate (CAGR) of 6.3% for the five-year period, 2014 to 2019.

Report Includes

  • An overview of the global markets for thin-layer deposition technologies, including chemical vapor deposition (CVD), ion implantation and epitaxy.
  • Analyses of global market trends, with data from 2013, estimates for 2014, and projections of CAGRs through 2019.
  • Discussion of the advantages and limitations of each technology.
  • Domestic and international technological issues.
  • Analysis of the industry's manufacturing capacity and consumption by various regional markets.

Report Scope

The scope of the study is limited to the three main technologies as named in the thin-layer deposition market. The materials used in these technologies are also studied and discussed in terms of their applications and unique properties. BCC Research analyzes the major types of CVD, ion implantation and epitaxy systems used to manufacture products in four key industries. Trends in demand and their impact on each thin-film technology, as well as key market drivers within each industry, are assessed and reviewed.

Analyst Credentials

Mr. Mayank Jain received a Master of Engineering degree in electronics-VLSI from BVU College of Engineering in Pune, India, and a bachelor’s degree in electronics and telecommunication from RGPV in Bhopal, India. He has nearly eight years of experience in the high-technology industry, specifically in the areas of business analysis, market research, and semiconductor sales and marketing. He has worked with leading market research, semiconductor products and service providers, including Gartner, Microsemi, and Infotech Enterprises. His interests include the SoC FPGA and ASIC research areas, embedded systems, green technologies, cloud computing, wireless networks, and automation.

Table of Contents & Pricing

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Published - Apr-2008| Analyst - Robert Moran| Code - SMC027G

Report Highlights

  • The global market for chemical vapor deposition (CVD) will increase from $7.0 billion in 2007 to an estimated $7.3 billion by the end of 2008. It should reach $11.8 billion by 2013, a compound annual growth rate (CAGR) of 10.2%.
  • The ion implantation segment will grow at a CAGR of 10.1% between 2008 and 2013 and be worth $4.4 billion by the end of the study period.
  • Molecular beam epitaxy (MBE) equipment is expected to reach $475.4 million in 2008. It is projected to grow at an 8.1% CAGR through the end of the forecast period to reach $701.3 million by 2013.
Published - Mar-2002| Analyst - Ralph Alexander| Code - SMC027F

Report Highlights

  • The total market for ion implantation equipment, services and materials is estimated at $1.05 billion in 2001 and is expected to rise to $3.41 billion in 2006, an average annual growth rate (AAGR) of 26.6%.
  • By contrast, ion implantation equipment and materials shipments both fell by 49% in 2001, the largest declines ever.
  • The total market for MBE equipment, services and materials is estimated to be $249 million in 2001, increasing to $1.05 billion in 2006 at an AAGR of 33.3%. Despite economic conditions, MBE equipment and materials shipments increased in 2001.
  • Spurring growth are the semiconductor merchant wafer markets. These will grow strongly through the period, particularly for thin-film silicon-on-insulator wafers made by ion implantation.
  • By 2006, the service markets for ion implantation and MBE are expected to be nearly as large as the respective equipment markets.

Published - Dec-2000| Analyst - Robert Moran| Code - SMC027E

Report Highlights

  • The value of worldwide shipments of PVD equipment reached $3.4 billion by 1999. Shipments are forecast to grow in value by 12.7% and reach $3.9 billion by the end of 2000, and at an average annual rate of 11.3% to reach $6.7 billion by 2005.
  • The value of materials to be deposited by PVD reached $474.2 million in 1999. It is projected to grow by 13.5% to reach $538.2 million by 2000 and at an average annual rate of 11.9% to reach $943.9 million by 2005.
  • The value of PVD services totaled $766.9 million in 1999. They will grow in value by 9.4% to reach $838.9 million by 2000 and at an average annual rate of 9.3% to reach $1.3 billion by 2005.

Published - Sep-2000| Analyst - Robert Moran| Code - SMC027D

Report Highlights

  • The value of worldwide shipments of CVD equipment reached $3.7 billion by 1999. Shipments are forecast to grow in value by 12.9% and reach $4.2 billion by the end of 2000, and at an average annual rate of 11.0% to reach $7.1 billion by 2005.
  • The value of materials to be deposited by CVD reached $450.8 million in 1999. It is projected to grow by 12.7% to reach $508 million by 2000 and at an average annual rate of 10.9% to reach $849.7 million by 2005.
  • The microelectronics industry, encompassing semiconductors, components, and flat panel displays represents the largest market for CVD equipment, materials and services. This sector will grow at an AAGR of about 12% through the forecast period. The growth of materials in this market will be led by dielectric and diamond-like films as device geometries continue to shrink and levels expand.

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